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Oxidation Behaviour of a Cu-Zr-Al Bulk Metallic Glass

机译:Cu-Zr-Al块状金属玻璃的氧化行为

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Cu58.1Zr35.9Al6 bulk metallic glass (BMG) rod samples were prepared by suction casting into a water-cooled copper mould. The amorphous structure was confirmed with x-ray diffraction. The Tg and Tx were 760K and 799K, respectively, from differential scanning calorimetry (DSC) results. Thin disc samples were cut and oxidized at temperatures from 573K to 773K in an oxygen atmosphere inside a thermogravimetric analyzer. The oxidation kinetics can be described with a parabolic rate law from 673K to 753K but follows a linear rate law at 573K to 653K and 773K. The oxidation products are mainly Cu2O, CuO and tetragonal ZrO2 based on X-ray diffraction and grazing incidence XRD (GIXRD) results. However, a very thin layer of Al2O3, with thickness of only tens of nanometers, on the top surface of the oxide layer was revealed by Auger electron spectroscopy (AES) depth profiles. This aluminium oxide layer is thought to contribute to the exceptionally good oxidation resistance at elevated temperatures compared with that of Cu60Zr30Ti10 we reported previously.
机译:Cu 58.1 Zr 35.9 Al 6 块状金属玻璃棒样品通过吸铸到水冷铜模中制备。通过X射线衍射确认了无定形结构。根据差示扫描量热法(DSC)的结果,T g 和T x 分别为760K和799K。切割薄盘样品并在热重分析仪内的氧气气氛中在573K至773K的温度下氧化。氧化动力学可以用673K至753K的抛物线速率定律描述,但遵循573K至653K和773K的线性速率定律。基于X射线衍射和掠入射XRD(GIXRD)结果,氧化产物主要为Cu 2 O,CuO和四方ZrO 2 。然而,通过俄歇电子能谱(AES)揭示了在氧化物层的顶面上非常薄的Al 2 O 3 层,厚度仅为几十纳米。 )深度剖面。与我们报道的Cu 60 Zr 30 Ti 10 相比,该氧化铝层被认为在高温下具有出色的抗氧化性。先前。

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