An investigation about image and voltage profile of Titanium Nano layer

摘要

Titanium thin films were deposited on glass substrates with the thickness of 40 nm.The layers are produced with physical vapor deposition method (heat evaporation),under high-vacuum condition. The nano-structures of the films were obtained, usingX-ray diffraction (XRD), and atomic force microscopy (AFM) methods. imageprofile and voltage diagram of nano layers were obtained titanium grains have nanometric height and a continues voltage on layer.