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首页> 外文期刊>Research Journal of Applied Sciences: RJAS >Analyzing Optical Reflectance of Semiconductors: An Application to Silicon
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Analyzing Optical Reflectance of Semiconductors: An Application to Silicon

机译:分析半导体的光反射率:在硅中的应用

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The optical parameters of Silicon (Si) were determined from available data of normal reflectance of single crystal silicon measured at 0.01 eV-30 eV range by unpolarized light. Kramers-Kronig Analysis relationship was used to determine the optical parameters from the reflectance data. The results obtained from the KKT analysis was found to be in a satisfactory agreement with the previous results and literatures with little disparity observed for some optical parameters, particularly extinction coefficient, which was as a result of approximation made in extrapolation method used in evaluating reflectance phase shift/angle. From the calculated values of optical parameters by KKT analysis, an overview of electronic band structure of silicon was given particularly from the optical transition strength and absorption edge spectral. The relationship between efficiency of devices made from silicon and its band structures were also established.
机译:硅(Si)的光学参数是根据非偏振光在0.01 eV-30 eV范围内测得的单晶硅法向反射率的可用数据确定的。使用Kramers-Kronig分析关系从反射率数据确定光学参数。从KKT分析获得的结果与先前的结果和文献发现令人满意,在某些光学参数(尤其是消光系数)方面观察到的差异很小,这是由于在评估反射相时使用外推法得出的近似结果移位/角度。根据通过KKT分析计算出的光学参数值,特别是根据光学跃迁强度和吸收边缘光谱,对硅的电子能带结构进行了概述。还建立了由硅制成的器件的效率与其能带结构之间的关系。

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