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Low temperature diffusivity of self-interstitial defects in tungsten

机译:钨自填隙缺陷的低温扩散率

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摘要

The low temperature diffusivity of nanoscale crystal defects, where quantum mechanical fluctuations are known to play a crucial role, are essential to interpret observations of irradiated microstructures conducted at cryogenic temperatures. Using density functional theory calculations, quantum heat bath molecular dynamics and open quantum systems theory, we evaluate the low temperature diffusivity of self-interstitial atom clusters in tungsten valid down to temperatures of 1 K. Due to an exceptionally low defect migration barrier, our results show that interstitial defects exhibit very high diffusivity of order over the entire range of temperatures investigated.
机译:纳米级晶体缺陷的低温扩散率,其中量子力学的波动起着至关重要的作用,对于解释在低温下进行的辐照微观结构的观察至关重要。使用密度泛函理论计算,量子热浴分子动力学和开放量子系统理论,我们评估了有效至1 K的温度下钨中自填隙原子团簇的低温扩散率。由于缺陷迁移势垒极低,我们的结果结果表明,间隙缺陷在所研究的整个温度范围内均表现出很高的有序扩散系数。

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