Comparison of Silicon Nanocrystals Prepared by Two Fundamentally Different Methods

摘要

This work compares structural and optical properties of silicon nanocrystals prepared by two fundamentally different methods, namely, electrochemical etching of Si wafers and low-pressure plasma synthesis, completed with a mechano-photo-chemical treatment. This treatment leads to surface passivation of the nanoparticles by methyl groups. Plasma synthesis unlike electrochemical etching allows selecting of the particle sizes. Measured sizes of the nanoparticles by dynamic light scattering show 3 and 20?nm for electrochemically etched and plasma-synthetized samples, respectively. Plasma-synthetized 20-nm particles do not exhibit photoluminescence due to absence of quantum confinement effect, and freshly appeared photoluminescence after surface passivation could indicate presence of organic molecules on the nanoparticle surface, luminescing instead of nanocrystal core. Electrochemically etched sample exhibits dramatic changes in photoluminescence during the mechano-photo-chemical treatment while no photoluminescence is observed for the plasma-synthetized one. We also used the Fourier transform infrared spectroscopy for comparison of the chemical changes happened during the treatment.