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A radial basis function WENO method with stencil adaptivity

机译:具有模板适应性的径向基函数WENO方法

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In this paper, the flexibility in the choice of stencil sizes in the radial basis function Weighted Essentially Non-Oscillatory (WENO) reconstruction is used to develop a stencil adaptivity strategy that will be coupled with the WENO method. The size of the stencil is determined by the value of an a posteriori error indicator which determines whether the stencil lies in a smooth region of the solution or across a discontinuity. Numerical results are presented for thin plate spline reconstruction to illustrate the benefits of the proposed method.
机译:在本文中,在径向基函数加权基本非振荡(WENO)重建中选择模板尺寸的灵活性用于开发将与WENO方法结合的模板适应性策略。模板的大小由后验误差指示符的值确定,后验误差指示符确定模板是否位于解决方案的平滑区域或不连续处。给出了薄板样条重构的数值结果,以说明该方法的优点。

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