首页> 外文期刊>International Journal of Photoenergy >Plasmon-Enhanced Photoluminescence of an Amorphous Silicon Quantum Dot Light-Emitting Device by Localized Surface Plasmon Polaritons in Ag/SiOx:a-Si QDs/Ag Sandwich Nanostructures
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Plasmon-Enhanced Photoluminescence of an Amorphous Silicon Quantum Dot Light-Emitting Device by Localized Surface Plasmon Polaritons in Ag/SiOx:a-Si QDs/Ag Sandwich Nanostructures

机译:Ag / SiOx:a-Si QDs / Ag三明治纳米结构中局部表面等离激元极化子对非晶硅量子点发光器件的等离激元增强光致发光

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We investigated experimentally the plasmon-enhanced photoluminescence of the amorphous silicon quantum dots (a-Si QDs) light-emitting devices (LEDs) with theAg/SiOx:a-Si QDs/Ag sandwich nanostructures, through the coupling between the a-Si QDs and localized surface plasmons polaritons (LSPPs) mode, by tuning a one-dimensional (1D) Ag grating on the top. The coupling of surface plasmons at the top and bottomAg/SiOx:a-Si QDs interfaces resulted in the localized surface plasmon polaritons (LSPPs) confined underneath the Ag lines, which exhibit the Fabry-Pérot resonance. From the Raman spectrum, it proves the existence of a-Si QDs embedded in Si-richSiOxfilm (SiOx:a-Si QDs) at a low annealing temperature (300°C) to prevent the possible diffusion of Ag atoms from Ag film. The photoluminescence (PL) spectra of a-Si QDs can be precisely tuned by a 1D Ag grating with different pitches and Ag line widths were investigated. An optimized Ag grating structure, with 500 nm pitch and 125 nm Ag line width, was found to achieve up to 4.8-fold PL enhancement at 526 nm and 2.46-fold PL integrated intensity compared to the a-Si QDs LEDs without Ag grating structure, due to the strong a-Si QDs-LSPPs coupling.
机译:我们通过a-Si QD之间的耦合实验研究了具有Ag / SiOx:a-Si QDs / Ag夹心纳米结构的非晶硅量子点(a-Si QDs)发光器件(LED)的等离激元增强光致发光通过调整顶部的一维(1D)Ag光栅,实现局部表面等离子体激元极化子(LSPPs)模式。 Ag / SiOx:a-Si QDs顶部和底部表面等离激元的耦合导致局域表面等离激元极化子(LSPPs)局限在Ag线下方,表现出Fabry-Pérot共振。从拉曼光谱中,证明了在低退火温度(300°C)下嵌入富硅SiOx膜(SiOx:a-Si QDs)中的a-Si QD的存在,以防止Ag原子可能从Ag膜扩散。 a-Si QD的光致发光(PL)光谱可以通过一维间距不同的一维Ag光栅精确调谐,并研究了Ag线宽。发现与不具有Ag光栅结构的a-Si QDs LED相比,具有500μnm间距和125μnmAg线宽的优化的Ag光栅结构在526 nm处实现了4.8倍的PL增强,PL集成强度达到了2.46倍,由于a-Si QDs-LSPPs的强耦合。

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