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Construction of a Linkage Map and QTL analysis for Black Rot Resistance in Brassica oleracea L.

机译:甘蓝黑腐病抗性连锁图谱的构建及QTL分析。

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For quantitative trait loci (QTL) controlling resistance to Xanthomonas campestris pv. Campestris , we constructed linkage map using cleaved amplified plymorphic sequences (CAPS) and sequence-related amplified polymorphism (SRAP) analysis with disease rating of F 3 families obtained from a susceptible broccoli and resistant cabbage [Green commet P09 × Reiho P01]. We established inoculation technique. In this technique, leaves from approximately 50-day old F 3 plants were inoculated by cutting 1.0 cm at mid vain near the margins. A total of 38 CAPS and 60 SRAP primer pairs were screened to assess parental polymorphism against black rot resistance. Ninety two markers were distributed in 10 linkage groups (LGs) covering 320.5 cM (centimorgan), with average 3.56 cM interval between markers. Two genomic regions on LG 2 and LG 9 were significantly associated with resistance to the disease. The analysis revealed QTLs in the map interval between CAM1 – GSA1 on LG 2 accounting for up to 10% of the phenotypic variation and one QTL in the map interval between F12-R12e – BORED on LG 9 explaining 16% phenotypic variation with LOD score of 3.09. Two additional non-significant QTLs on LG 3 in the interval between CHI – ASB1 (LOD = 2.04) and on LG 7 in the interval between IPI – FLC3 (LOD = 2.25) were also detected for resistance to the disease. The QTLs, which were mapped to LG 2 and LG 9 for the disease, could be useful for marker-assisted selection in resistance breeding. Key words: Linkage map; QTL; Black rot; Resistance; Brassica oleracea DOI: http://dx.doi.org/10.3329/ijns.v1i1.8591 International Journal of Natural Sciences (2011), 1(1):1-6
机译:对于定量性状基因座(QTL),控制对黄单胞菌xv的抗性。 Campestris,我们使用裂解的扩增多态性序列(CAPS)和与序列相关的扩增多态性(SRAP)分析构建了连锁图,该序列具有从易感的西兰花和抗性白菜[绿色Commet P09×Reiho P01]获得的F 3家族的疾病等级。建立了接种技术。在该技术中,通过在边缘附近的中部切开1.0cm,接种来自约50日龄的F 3植物的叶子。总共筛选了38对CAPS和60对SRAP引物,以评估针对黑腐病抗性的亲本多态性。 92个标记分布在10个连锁组(LG)中,覆盖320.5 cM(厘摩),标记之间的平均间隔为3.56 cM。 LG 2和LG 9上的两个基因组区域与对该疾病的抵抗力显着相关。分析显示,LG 2的CAM1-GSA1之间的图谱间隔中的QTL占表型变异的10%,而LG 9的F12-R12e-BORED的图中间隔中的QTL解释了16%的表型变异,LOD得分为3.09。还检测到LG 3在CHI – ASB1(LOD = 2.04)的间隔和LG 7在IPI – FLC3(LOD = 2.25)的间隔的两个非重要QTL对该病的抗性。定位于LG 2和LG 9的QTL,可用于抗性育种中的标记辅助选择。关键字:连锁图; QTL;黑腐病抵抗性;芸苔DOI:http://dx.doi.org/10.3329/ijns.v1i1.8591国际自然科学杂志(2011),1(1):1-6

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