Structure and Microstructure of Ni-Mn-Ga thin films

摘要

Ni-Mn-Ga thin films were dc magnetron sputter deposited onto well cleaned substrates of si(100) and glass in high pure argon atmosphere of pressure of 0.01 mbar using NiMnGa alloy targets prepared in our laboratory by vacuum induction melting technique. Pristine thin films were investigated. Crystal structure of the films was studied using x-ray diffraction (XRD) technique. Microstructure of the films was investigated using scanning electron microscope (SEM). XRD reveals that the films on glass substrates are amorphous and films on si(100) substrates posses L21 structure . SEM microstructure shows that the films on si(100) are polycrystalline in pristine form.