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Electrodeposition of In2S3 Thin Films onto FTO Substrate from DMSO Solution

机译:DMSO溶液将In 2 S 3 薄膜电沉积到FTO衬底上

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In current work we report the electrochemical deposition of In2S3 thin films from a In(ClO4)3 and S8 indimethylsulfoxide (DMSO) solution. Potenciodynamic experiments were conducted to study theelectrochemical response of the precursors in the organic solvent. Chronoamperometric measurementsallowed to establish the nucleation-growth mechanism of the indium sulfide phase and also to build aproper potential step program for achieving adherent good quality thin films. SEM micrographs2 exhibited complete substrate coverage whereas EDAX analysis gave In/S ratio very close to /3.Grazing XRD analysis showed that the films were grown in the tetragonal phase without the presenceof oxide or hydroxide phases as usually is reported in aqueous medium. Results open the possibility ofapplying the procedure to the electrodeposition of an alternative In2S3 buffer layer onto copper indiumdiselenide substrates for evaluating the performance of the corresponding solar cell.
机译:在当前的工作中,我们报告了从In(ClO4)3和S8在二甲基亚砜(DMSO)溶液中电化学沉积In2S3薄膜。进行了电位动力学实验以研究前体在有机溶剂中的电化学反应。计时安培测量可以建立硫化铟相的成核-生长机理,并可以建立适当的潜在步骤程序以实现附着的高质量薄膜。 SEM显微照片2表现出完全的基材覆盖,而EDAX分析显示In / S比非常接近/ 3。放牧XRD分析表明,薄膜在四方相中生长,而没有在水介质中通常存在的氧化物或氢氧化物相。结果为将替代的In2S3缓冲层电沉积到铜铟二硒化物基板上进行电沉积以评估相应太阳能电池性能的可能性提供了可能性。

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