In this paper, porous silicon photonic crystals were simulated and fabricated as distributed Braggreflectors (DBRs), graded DBRs and Fabry-Perot (FP) filters. The transfer matrix method (TMM) wasused to model the propagation of light in the photonic crystal. The porous silicon photonic crystalswere fabricated by electrochemically etching p-type (100) silicon in 12% hydrofluoric acid solution.Applied currents of 20mA and 120mA were used to produce the varying refractive indices of thelayers. Distributed Bragg reflectors were tuned to have their central wavelength at 650nm, 700nm, and800nm while the FP filter optical cavity was tuned to 650nm. Results show the effective formation ofuniform and graded DBR with maximum gradation of 300nm. Simulation of DBR and FP reflectivityyielded a maximum of 2.51% and 0.37% deviation from the simulated values. Results show that theexperimental data was in good agreement with the simulated reflectivity at the different centralwavelengths. The paper has shown the ease and versatility in the fabrication of porous silicon asphotonic crystals.
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