首页> 外文期刊>International Journal of Electrochemical Science >Influence of Electrodeposition Conditions on the Microstructure and Hardness of Ni-B/SiC Nanocomposite Coatings
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Influence of Electrodeposition Conditions on the Microstructure and Hardness of Ni-B/SiC Nanocomposite Coatings

机译:电沉积条件对Ni-B / SiC纳米复合镀层组织和硬度的影响

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In this study, Ni-B/SiC nanocomposite coating was prepared by electrodeposition using trimethylamine borane (TMAB) as boron source in a Ni-B electrolyte containing dispersed SiC nanoparticles. The effects of trimethylamine borane, SiC nanoparticles, current density, thermal treatment on the properties of the electrodeposited coatings were examined by SEM, EDS, XRD et al. The results show that the Ni-B/SiC composite coating exhibits nodular and uniform structure with a desirable interface between the coating and substrate. The as-deposited coatings exhibit Ni (111), Ni (220) and Ni (311) reflections. The boron content in the coating is determined by the ratio of the rate of nickel reduction and the rate of trimethylamine borane decomposition, which facilitates the formation of the amorphous phase. SiC content in the coating can substantially improve the hardness of the coatings under the as-deposited conditions, which promotes the grain refinement due to the fact that particles can act as nucleation sites during the deposition process. Both the boron and SiC nanoparticle content in the deposited Ni-B/ SiC coating decreases as the current density increased from 1 to 7 A dm-2.
机译:在这项研究中,通过使用三甲胺硼烷(TMAB)作为硼源在含有分散的SiC纳米颗粒的Ni-B电解质中进行电沉积来制备Ni-B / SiC纳米复合涂层。 SEM,EDS,XRD等研究了三甲胺硼烷,SiC纳米颗粒,电流密度,热处理对电沉积涂层性能的影响。结果表明,Ni-B / SiC复合涂层呈现结节状和均匀的结构,在涂层和基底之间具有理想的界面。沉积的涂层表现出Ni(111),Ni(220)和Ni(311)反射。涂层中的硼含量由镍还原速率与三甲胺硼烷分解速率之比确定,这有助于形成非晶相。涂层中的SiC含量可以在沉积条件下显着提高涂层的硬度,由于颗粒可以在沉积过程中充当成核位置,因此可以促进晶粒细化。随着电流密度从1 A dm-2增加到7 A dm-2,沉积的Ni-B / SiC涂层中的硼和SiC纳米颗粒含量均降低。

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