Fabrication of IR transparent zinc sulphide plate by chemical vapour deposition (CVD)

Biswas Papiya; Johnson Roy; Ramavath Pandu; Ravi Kurisetty Venkata

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Fabrication of IR transparent zinc sulphide plate by chemical vapour deposition (CVD)

机译：通过化学气相沉积（CVD）制备IR透明硫化锌板

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《Indian journal of chemical technology》 |2016年第5期|共页
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Biswas Papiya; Johnson Roy; Ramavath Pandu; Ravi Kurisetty Venkata;
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1. Fabrication of IR transparent zinc sulphide plate by chemical vapour deposition (CVD) [J] . Biswas Papiya, Ramavath Pandu, Johnson Roy, Indian Journal of Chemical Technology . 2016,第5期

机译：通过化学气相沉积（CVD）制备IR透明硫化锌板
2. Aerosol assisted chemical vapour deposition of transparent conductive aluminum-doped zinc oxide thin films from a zinc triflate precursor [J] . Manzi Joe A., Knapp Caroline E., Parkin Ivan P., Thin Solid Films . 2016,第octa1期

机译：从三氟甲磺酸锌前体气溶胶辅助化学气相沉积透明导电掺杂铝的氧化锌薄膜
3. Single source chemical vapour deposition of zinc sulphide thin films film composition and structure [J] . N. H. Tran, R. N. Lamb, G. L. Mar Colloids and Surfaces, A. Physicochemical and Engineering Aspects . 1999,第1期

机译：单源化学气相沉积硫化锌薄膜的膜组成和结构
4. Optical second harmonic imaging of zinc oxide thin films grown by metal organic chemical vapour deposition (MOCVD) [C] . T. Scheidt, E. G. Rohwer, H. M. von Bergmann, Conference on Photo-Responsive Materials; 20040225-29; Kariega Game Reserve(ZA) . 2004

机译：通过金属有机化学气相沉积（MOCVD）生长的氧化锌薄膜的光学二次谐波成像
5. Chemical Vapour Deposition (CVD) of Graphene on Transition Metals and Its Protective Properties [D] . Nazarova, Marina. 2019

机译：过渡金属上石墨烯的化学气相沉积（CVD）及其保护性能
6. Synthesis solution dynamics and chemical vapour deposition of heteroleptic zinc complexes via ethyl and amide zinc thioureides [O] . Malavika A. Bhide, Kristian L. Mears, Claire J. Carmalt, 2021

机译：通过乙基和酰胺硫化物的杂种锌络合物的合成溶液动力学和化学气相沉积
7. Hot-wall chemical vapour deposition (CVD) process for germanium sulphide glass waveguides fabrication [O] . Huang Chung-Che, Hewak Daniel 2005

机译：用于硫化锗玻璃波导制造的热壁化学气相沉积（CVD）工艺
8. Continuous SiN(sub x) Plasma Processing Using the Inline MW RPECVD (MicroWaveRemote Plasma Enhanced Chemical Vapour Deposition) System [R] . Weeber, A. W., Soppe, W. J. 2001

机译：使用Inline mW RpECVD（microWave远程等离子体增强化学气相沉积）系统进行连续siN（sub x）等离子体处理

Fabrication of IR transparent zinc sulphide plate by chemical vapour deposition (CVD)

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