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Influence of acetic acid complex on physical properties of spray deposited FeSe thin films

机译:乙酸络合物对喷镀FeSe薄膜物理性能的影响

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The iron selenide thin films were successfully deposited on to the glass substrates at 573 K temperature using spray pyrolysis technique. Along with Fe and Se source, acetic acid (CH3-COOH) was used as a complexing agent during the deposition process. The structural, morphological, electrical and optical properties of the deposited films have been studied using X-ray diffraction, scanning electron microscopy, atomic force microscopy and UV-Vis spectrophotometer respectively. The XRD analysis shows that the spray deposited FeSe thin films are nanocrystalline with tetragonal lattice. The surface studies of FeSe films shows porous morphology with spherical grains which is improved with addition of acetic acid. The AFM image indicates that the as deposited FeSe thin films are uniform, compact and well covered to the substrate. The absorption studies shows that films have direct band gap which varies between 3.05 to 2.60 eV depending on the quality of acetic acid added in the spray solution. The variation of electrical resistivity with temperature confirms semiconductor behavior of FeSe
机译:使用喷雾热解技术将硒化铁薄膜成功沉积在573 K温度的玻璃基板上。在沉积过程中,将乙酸(CH3-COOH)与铁和硒源一起用作络合剂。分别使用X射线衍射,扫描电子显微镜,原子力显微镜和UV-Vis分光光度计研究了沉积膜的结构,形态,电学和光学性质。 XRD分析表明,喷射沉积的FeSe薄膜是具有四方晶格的纳米晶体。 FeSe薄膜的表面研究显示出球形颗粒的多孔形态,通过添加乙酸可以改善这种形态。 AFM图像表明,所沉积的FeSe薄膜是均匀,致密的,并被基材很好地覆盖。吸收研究表明,薄膜具有直接的带隙,取决于在喷雾溶液中添加的乙酸的质量,其带隙在3.05至2.60 eV之间变化。电阻率随温度的变化证实了FeSe的半导体性能

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