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首页> 外文期刊>APL Materials >Film transfer enabled by nanosheet seed layers on arbitrary sacrificial substrates
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Film transfer enabled by nanosheet seed layers on arbitrary sacrificial substrates

机译:通过任意牺牲基材上的纳米片晶种层实现薄膜转移

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An approach for film transfer is demonstrated that makes use of seed layers of nanosheets on arbitrary sacrificial substrates. Epitaxial SrTiO3, SrRuO3, and BiFeO3 films were grown on Ca2 Nb 3O10 nanosheet seed layers on phlogopite mica substrates. Cleavage of the mica substrates enabled film transfer to flexible polyethylene terephthalate substrates. Electron backscatter diffraction, X-ray diffraction, and atomic force microscopy confirmed that crystal orientation and film morphology remained intact during transfer. The generic nature of this approach is illustrated by growing films on zinc oxide substrates with a nanosheet seed layer. Film transfer to a flexible substrate was accomplished via acid etching.
机译:展示了一种膜转移方法,该方法利用了任意牺牲基材上的纳米片晶种层。外延SrTiO3,SrRuO3和BiFeO3薄膜在金云母云母衬底上的Ca2 Nb 3O10纳米片种子层上生长。云母基底的切割使得能够将膜转移至柔性聚对苯二甲酸乙二醇酯基底。电子背散射衍射,X射线衍射和原子力显微镜证实,在转移过程中晶体取向和膜形态保持不变。通过在具有纳米片晶种层的氧化锌衬底上生长膜来说明这种方法的一般性质。通过酸蚀刻将膜转移到柔性基底上。

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