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Research of shot noise based on realistic nano-MOSFETs

机译:基于现实的纳米MOSFET的散粒噪声研究

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Experimental measurements and simulation results have shown that the dominant noise source of current noise changes from thermal noise to shot noise with scaling of MOSFET, and shot noise were suppressed by Fermi and Coulomb interactions. In this paper, Shot noise test system is established, and experimental results proved that shot noise were suppressed, and the expressions of shot noise in realistic nano-MOSFETs are derived with considering Fermi effect, Coulomb interaction and the combination of the both co-existence, respectively. On this basis, the variation of shot noise with voltage, temperature and source-drain doping were researched. The results we obtained are consistent with those from experiments and the theoretically explanation is given. At the same time, the shot noise test system is suitable for traditional nanoscale electronic components; the shot noise model is suitable for nanoscale MOSFET.
机译:实验测量和仿真结果表明,电流噪声的主要噪声源随MOSFET的缩放从热噪声变为散粒噪声,散粒噪声被费米和库仑相互作用抑制。本文建立了散粒噪声测试系统,并通过实验证明了散粒噪声得到了抑制,并结合费米效应,库仑相互作用以及两者的共存关系,推导了现实纳米MOSFET散粒噪声的表达式。 , 分别。在此基础上,研究了散粒噪声随电压,温度和源漏掺杂的变化。我们获得的结果与实验结果一致,并给出了理论解释。同时,散粒噪声测试系统适用于传统的纳米级电子元件;散粒噪声模型适用于纳米级MOSFET。

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