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首页> 外文期刊>AIP Advances >Effect of self-bias on cylindrical capacitive discharge for processing of inner walls of tubular structures—Case of SRF cavities
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Effect of self-bias on cylindrical capacitive discharge for processing of inner walls of tubular structures—Case of SRF cavities

机译:自偏压对圆柱形电容放电的影响,用于处理管状结构的内壁—SRF腔的情况

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Cylindrical capacitive discharge is a convenient medium for generating reactive ions to process inner walls superconductive radio-frequency (SRF) cavities. These cavities, used in particle accelerators, presents a three-dimensional structure made of bulk Niobium, with axial cylindrical symmetry. Manufactured cavity walls are covered with Niobium oxides and scattered particulates, which must be removed for desired SRF performance. Cylindrical capacitive discharge in a mixture of Ar and Cl2 is a sole and natural non-wet acid choice to purify the inner surfaces of SRF cavities by reactive ion etching. Coaxial cylindrical discharge is generated between a powered inner electrode and the grounded outer electrode, which is the cavity wall to be etched. Plasma sheath voltages were tailored to process the outer wall by providing an additional dc current to the inner electrode with the help of an external compensating dc power supply and corrugated design of the inner electrode. The dc bias potential difference is established between two electrodes to make the set-up favorable for SRF wall processing. To establish guidelines for reversing the asymmetry and establishing the optimal sheath voltage at the cavity wall, the dc self-bias potential and dc current dependence on process parameters, such as gas pressure, rf power and chlorine content in the Ar/Cl2 gas mixture was measured. The process is potentially applicable to all concave metallic surfaces.
机译:圆柱电容放电是一种方便的介质,可用于生成反应离子来处理内壁超导射频(SRF)腔。这些用于粒子加速器的腔体呈现出由大块铌制成的三维结构,具有轴向圆柱对称性。制造的腔壁上覆盖有氧化铌和分散的颗粒,必须去除这些颗粒才能获得所需的SRF性能。 Ar和Cl2混合物中的圆柱形电容性放电是唯一且自然的非湿酸选择,以通过反应性离子蚀刻来净化SRF腔体的内表面。在通电的内部电极和接地的外部电极(要蚀刻的腔壁)之间会产生同轴的圆柱形放电。通过在外部补偿直流电源和内部电极的波纹设计的帮助下,通过向内部电极提供额外的直流电流,来定制等离子护套电压以处理外壁。在两个电极之间建立了直流偏置电势差,以使设置适合于SRF壁处理。为了建立用于逆转不对称性和在腔壁处建立最佳护套电压的准则,直流自偏置电势和直流电流取决于工艺参数,例如气压,rf功率和Ar / Cl2气体混合物中的氯含量,测量。该工艺可能适用于所有凹形金属表面。

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