Study of Structural and electrical Properties of WO3 as Thin Films

摘要

Three thin films were prepared by PVD starting from WO 3 powder with thicknesses ( 998.7, 1620, 2240 nm ) respectively on glass substrates under limited thermal and pressure conditions, studied their I-V characteristics and calculated the sensitivity for 100 ppm of ethanol vapor adsorption (The temperature of the films have been changed from 25°C to 350°C). A comparison among them was achieved at 300 °C as an operating degree and found that the 1620 nm WO 3 has more sensitivity and has more power to adsorb for ethanol vapor on it. The crystal structure of the prepared WO 3 thin films were characterized by X-ray diffraction, then the comparison of the development which happened on the crystal structure reasons of deposition were studied. the crystal size has been calculated from patterns X-ray diffraction depended Scherrer Equation