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Effect of Al atom Doping on Band Gap of Rectangular Cross Section Si nanowire

机译:Al原子掺杂对矩形截面Si纳米线带隙的影响

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In this work band gap of hydrogen-passivated, free-standing silicon nanowires, oriented along [111] direction with rectangular cross section was studied. Further the effect of doping of Al atom on band structure is also analyzed by using GGA approximation. it is found that the band gap of H-SiNW dramatically reduced upon doping and nanowire start behaving as bulk silicon.
机译:在该工作带中,研究了氢钝化的自立式硅纳米线的间隙,其沿[111]方向取向,具有矩形截面。此外,还通过使用GGA近似分析了Al原子掺杂对能带结构的影响。已经发现,在掺杂时,H-SiNW的带隙显着减小,并且纳米线开始表现为体硅。

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