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The Textural Effect of Cu Doping and the Electronic Effect of Ti, Zr and GeDopings Upon the Physical Properties of In2O3and Sn-Doped In2O3Ceramics

机译:Cu掺杂的结构效应和Ti,Zr和Ge掺杂的电子效应对In2O3和Sn掺杂的In2O3陶瓷物理性能的影响

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The electronic properties of Cu-, Ti-, Zr-, and Ge-doped In2O3(IO) and ITO (Sn-doped In2O3) ceramicsare investigated. We distinguish the different effect of Cu doping (so called the “textural effect”) andof Ti, Zr and Ge dopings (so called the “electronic effect”) of IO and ITO ceramics. Indeed, Cu dopingin IO and ITO enhances the ceramic density and thereby the conductivity due to an increase in thecarrier mobility (grain boundary effect); the absorbance in the visible region is then lowered. Mostinterestingly for Ti-, Zr-, and Ge-doped samples, the increase of conductivity associated with an enlargementof the electron-mobility along with a decrease of the absorbance in the visible, account forthe weak interactions occuring between the conduction-band electrons and the ionized donor centers.
机译:研究了Cu,Ti,Zr和Ge掺杂的In2O3(IO)和ITO(Sn掺杂的In2O3)陶瓷的电子性能。我们区分了IO和ITO陶瓷的Cu掺杂(所谓的“结构效应”)和Ti,Zr和Ge掺杂的不同效应(所谓的“电子效应”)。实际上,由于载流子迁移率的增加(晶粒边界效应),Cu掺杂物IO和ITO增强了陶瓷密度,从而提高了电导率。然后降低可见光区域的吸光度。对于Ti,Zr和Ge掺杂的样品,最有趣的是,电导率的增加与电子迁移率的增加以及可见光吸收率的降低有关,这说明了导带电子和电子之间发生的弱相互作用。电离供体中心。

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