Study of Electronic Structure of Tin-Doped In<SUB>2</SUB>O<SUB>3</SUB> Film Deposited on Glass

Ali Hassanzadeh; Mohammad Hossein Habibi; Asghar Zeini-isfahani

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Study of Electronic Structure of Tin-Doped In₂O₃ Film Deposited on Glass

机译：锡沉积在玻璃上的_{2 O _{3 薄膜的电子结构研究}}

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《Acta Chimica Slovenica》 |2004年第3期|共1页
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Ali Hassanzadeh; Mohammad Hossein Habibi; Asghar Zeini-isfahani;
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中图分类化学;
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1. Study Of Electronic Structure Of Tin-Doped In_2O_3 (ITO) Film Deposited On Glass [J] . Ali Hassanzadeh, Mohammad Hossein Habibi, Asghar Zeini-Isfahani Acta Chimica Slovenica . 2004,第3期

机译：玻璃上锡掺杂In_2O_3（ITO）薄膜的电子结构研究
2. Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering [J] . T. Sasabayashi, N. Ito, E. Nishimura, Thin Solid Films . 2003,第2期

机译：r.f.沉积的掺杂锡的氧化铟和氧化铟锌膜的结构和内应力的比较研究磁控溅射
3. Solvothermally-synthesized tin-doped indium oxide plasmonic nanocrystals spray-deposited onto glass as near-infrared electrochromic films [J] . Maho Anthony, Lamela Laura Comeron, Henrist Catherine, Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 2019,第期

机译：作为近红外电致变色薄膜将溶剂热合成的氧化铟氧化铟氧化物纳米晶体喷涂到玻璃上
4. Spray Deposited Thin Films of Tin-Doped Indium Oxide for Optoelectronic Applications [C] . Oleksandr Malik, F. J. De la Hidalga-W International Conference on Micro Nano Devices, Structure and Computing Systems . 2013

机译：用于光电应用的锡掺杂氧化铟的喷雾薄膜
5. MICROSTRUCTURE DEVELOPMENT AND ELECTRICAL PROPERTIES OF RUTHENIUM DIOXIDE - GLASS THICK FILM RESISTORS - A NONISOTHERMAL STUDY (HYBRID CIRCUITS, ELECTROCERAMICS, MICROELECTRONICS). [D] . CHITALE, SANJAY MADHAV. 1986

机译：二氧化钌的微结构发展和电学性质-玻璃厚膜电阻器-非等温研究（混合电路，电陶瓷，微电子学）。
6. Microstructure local electronic structure and optical behaviour of zinc ferrite thin films on glass substrate [O] . Jitendra Pal Singh, Byeong-Hyeon Lee, Weon Cheol Lim, 2018

机译：玻璃基板上铁酸锌薄膜的微观结构局部电子结构和光学性能
7. Effects of Substrate Temperature on Properties of Tin-Doped Indium Oxide Films Deposited by Activated Electron Beam Evaporation [O] . Hiroyasu KOJIMA, Nagahiro SAITO, Osamu TAKAI 2012

机译：基材温度对掺杂型氧化铟氧化物膜的性能蒸发的影响

Study of Electronic Structure of Tin-Doped In2O3 Film Deposited on Glass

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Study of Electronic Structure of Tin-Doped In₂O₃ Film Deposited on Glass