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Influence of Grit-Blasting and Hydrofluoric Acid Etching Treatment on Surface Characteristics and Biofilm Formation on Zirconia

机译:喷砂和氢氟酸腐蚀处理对氧化锆表面特性和生物膜形成的影响

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The objective of this study was to investigate the effect of hydrofluoric acid etching treatment on the surface characteristics of zirconia and Streptococcus sanguinis ( S. sanguinis ) and Porphyromonas gingivalis ( P. gingivalis ) biofilm formation on zirconia. Zirconia specimens were prepared with different treatments, including being polished with 1000-grit SiC abrasive paper as the control group (Group C), grit-blasted with 110 μm silica-coated alumina particles (Group GB), etched with 40% hydrofluoric acid for 25 min at 100 °C (Group HF), and grit-blasted with 110 μm silica-coated alumina particles and then etched with 40% hydrofluoric acid for 25 min at 100 °C (Group GBHF). The highest surface roughness values and hydrophilicity were shown in Group HF and Group GBHF. Scanning electron microscopy (SEM) showed that hydrofluoric acid can create a crater-like appearance on the zirconia surface. An energy-dispersive X-ray (EDX) analysis demonstrated similar element concentration (wt %) in Group C, Group HF, and Group GBHF, but not for Group GB with higher concentrations of Al and Si element. Colony forming unit (CFU) counts showed that a similar amount of S. sanguinis biofilm and significantly lower P. gingivalis biofilm were formed on zirconia surfaces in Group HF and Group GBHF compared to that in Group C after three days of bacteria culture ( p < 0.05). These results indicate that hydrofluoric acid etching on zirconia may not increase S. sanguinis and P. gingivalis mature biofilm formation on zirconia.
机译:这项研究的目的是研究氢氟酸蚀刻处理对氧化锆和血红链球菌(S. sanguinis)和牙龈卟啉单胞菌(P. gingivalis)生物膜形成的表面特性的影响。用不同的处理方法制备了氧化锆样品,包括使用1000粒度的SiC砂纸作为对照组(C组)进行抛光,用110μm的二氧化硅包覆的氧化铝颗粒(GB组)进行喷砂处理,用40%的氢氟酸蚀刻以进行抛光。在100°C(HF组)下处理25分钟,然后用110μm二氧化硅包覆的氧化铝颗粒进行喷砂处理,然后在100°C(GBHF组)中用40%氢氟酸蚀刻25分钟。在HF组和GBHF组中显示了最高的表面粗糙度值和亲水性。扫描电子显微镜(SEM)显示,氢氟酸可在氧化锆表面形成类似火山口的外观。能量色散X射线(EDX)分析表明,在C组,HF组和GBHF组中元素浓度(wt%)相似,但对于Al和Si元素浓度较高的GB组则没有。菌落培养三天后,与C组相比,HF组和GBHF组的氧化锆表面形成了相似数量的S. sanguinis生物膜和明显降低的P. gingivalis生物膜,与C组相比(p < 0.05)。这些结果表明,在氧化锆上进行氢氟酸蚀刻可能不会增加氧化锆上的血红链霉菌和牙龈卟啉单胞菌成熟生物膜的形成。

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