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A Study of the Microstructure, Texture and Sputtering Properties of 5N High-purity Aluminum Target

机译:5N高纯铝靶材的组织,织构和溅射性能研究

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This investigation studies the effects of the microstructure and texture on the sputtering properties of a high purity aluminum target. In this study, the purity of aluminum target is as high as 99.999% (5N). The 5N aluminum ingot first underwent hot-rolling and heat treatment, and was then cut into different kinds of test specimens. A series of microstructural observations, texture analyses and sputtering experiments were conducted to study the properties of the 5N aluminum target. The research results show that the 5N aluminum target experiences dynamic recovery during hot-rolling due to its high stacking fault energy. Heat treatment at the proper temperature could help the 5N aluminum target complete recrystallization, enabling the target to possess a fine grain and cube texture. In addition, since the purity of the aluminum target is as high as 99.999%, any slight temperature deviation during hot-rolling and heat treatment would affect the microstructure and texture of the aluminum target. The results of the sputtering experiments show that any undesirable microstructure or texture of the aluminum target would influence its sputtering rate and the properties of the aluminum thin film after sputtering. A fine grain and cube texture are beneficial to the 5N aluminum target by permitting an increased sputtering rate, and allowing the aluminum thin film to possess a low electrical resistance after sputtering. Moreover, hillocks would appear on those aluminum thin films produced by an aluminum target with low sputtering rate at lower temperature, causing short circuits in the LCD panel. Therefore, to improve the sputtering rate of 5N aluminum target in order to obtain aluminum thin film with a low electrical resistance and excellent anti-hillock properties, the temperature of the hot-rolling and heat treatment must be controlled precisely to ensure that the aluminum target possesses a fine grain and cube texture.
机译:这项研究研究了微观结构和织构对高纯度铝靶溅射性能的影响。在这项研究中,铝靶的纯度高达99.999%(5N)。首先对5N铝锭进行热轧和热处理,然后将其切成不同种类的试样。进行了一系列的微观结构观察,织构分析和溅射实验,以研究5N铝靶材的性能。研究结果表明,由于5N铝靶材具有很高的堆垛层错能,因此在热轧过程中会经历动态恢复。在适当的温度下进行热处理可以帮助5N铝靶材完全重结晶,使靶材具有细小的晶粒和立方体纹理。另外,由于铝靶的纯度高达99.999%,因此在热轧和热处理期间的任何轻微的温度偏差都会影响铝靶的微观结构和织构。溅射实验的结果表明,铝靶的任何不希望的微观结构或质地都会影响其溅射速率和溅射后铝薄膜的性能。细小的晶粒和立方纹理对5N铝靶材有利,因为它可以提高溅射速率,并使铝薄膜在溅射后具有低电阻。此外,在较低温度下具有低溅射速率的铝靶材所产生的铝薄膜上会出现小丘,从而导致LCD面板短路。因此,为了提高5N铝靶材的溅射率以获得低电阻和优异的抗小丘性能的铝薄膜,必须精确地控制热轧和热处理的温度以确保铝靶材。拥有细小的颗粒和立方体纹理。

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