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GROWTH AND CHARACTERIZATION OF NANOCRYSTALLINE CdS THIN FILMS

机译:纳米CdS薄膜的生长和表征

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Nanocrystalline cadmium sulfide (CdS) thin films were deposited by thermal vacuum evaporation (TVE) from single source onto ITO covered optical glass substrates. These films were analyzed by atomic force microscopy (AFM), scanning electron microscopy (SEM) and spectroscopic ellipsometry (SE) in the range of 250 – 1700 nm. The optical constants as well as the films thicknesses and the optical band gaps were obtained by fitting the experimental psi and del spectra from ellipsometric measurements. The recorded data were analyzed using a dedicated software package specially designed for optical modeling. The ellipsometrical parameters psi and del were acquired at three incidence angles (65°, 70°, 75°) for a high number of wavelenghts in the mentioned wavelength range.In order to determine the refractive index, the thickness and the surface roughness of CdS thin films, as well as for obtaining a smooth control for the experimental data fitting processes, the identification of the spectral regions in which the films showed good transparency is required. This working procedure generates a significantly increased number of optical models with a slightly reduced number of fitting parameters
机译:通过热真空蒸发(TVE)将纳米晶硫化镉(CdS)薄膜从单一来源沉积到ITO覆盖的光学玻璃基板上。通过原子力显微镜(AFM),扫描电子显微镜(SEM)和椭圆偏振光谱(SE)在250 – 1700 nm范围内对这些膜进行了分析。光学常数以及膜的厚度和光学带隙是通过拟合椭圆偏振测量的实验psi和del光谱获得的。使用专门设计用于光学建模的专用软件包来分析记录的数据。在上述波长范围内,对于大量的波长,在三个入射角(65°,70°,75°)处获取了椭偏参数psi和del.CdS的折射率,厚度和表面粗糙度薄膜,以及为了获得对实验数据拟合过程的平滑控制,需要确定薄膜显示出良好透明度的光谱区域。该工作程序会大大增加光学模型的数量,而拟合参数的数量会稍微减少

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