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Kinetic study and modelling of cephalexin removal from aqueous solution by advanced oxidation processes through artificial neural networks

机译:先进的氧化过程通过人工神经网络从水溶液中去除头孢氨苄的动力学研究和建模

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摘要

The degradation of the antibiotic cephalexin (CEX) was studied by UV direct photolysis and hydrogen peroxide combined with UVC and solar radiation. A factorial plan was used to evaluate the efficiency of the processes and the influence of variables. UVC direct photolysis had a minor contribution (12%) on CEX removal during the UV/H2O2 treatment. The best UV/H2O2 performance from the factorial plan was able to achieve a high degradation percentage for CEX and aromaticity (83.2% and 76.2%, respectively) in 60 min, while solar photolysis was not able to achieve high degradation percentage at the applied conditions. Statistical analyses pointed to the high statistical significance of the oxidant concentration for the process and the weak dependence of the other variables. The kinetic study demonstrated that the pseudo-first-order model was the more appropriate for both direct photolysis and UV/H2O2 treatments with rate constants of k(UVC) = 0.0031 min(-1) and k(UV/H2O2) = 0.0367 min(-1). The use of artificial neural network was proven to be efficient to predict CEX removal by photolysis and photochemical treatments from aqueous solutions.
机译:通过紫外线直接光解,过氧化氢,紫外线照射和太阳辐射,研究了抗生素头孢氨苄(CEX)的降解。析因计划用于评估流程的效率和变量的影响。在UV / H2O2处理过程中,UVC直接光解对CEX去除的贡献很小(12%)。阶乘计划中最佳的UV / H2O2性能能够在60分钟内实现较高的CEX和芳香性降解率(分别为83.2%和76.2%),而在应用条件下,太阳光解不能达到较高的降解率。统计分析指出,氧化剂浓度对该过程具有很高的统计意义,而其他变量的依赖性较弱。动力学研究表明,伪一阶模型更适合直接光解和UV / H2O2处理,其速率常数为k(UVC)= 0.0031 min(-1)和k(UV / H2O2)= 0.0367 min (-1)。事实证明,使用人工神经网络可以有效地预测通过水溶液中的光解和光化学处理来去除CEX。

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