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Photocurrent and capacitance investigations into the nature of the passive films on austenitic stainless steels

机译:光电流和电容研究奥氏体不锈钢上钝化膜的性质

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Photocurrent and capacitance measurements of semiconductor passive films formed on metals and alloys can be used to study the electronic properties and reveal indirect information about structure and composition. The current work used these techniques to investigate the electronic properties of the passive films formed on three austenitic stainless steels, types 304L, 316L and 254SMO, in borate. Evidence was found for the existence of a large number of localised mid bandgap states, consistent with amorphous oxides. However, the flat-band potentials of the austenitic stainless steel passive films were found to be independent of both composition and measuring frequency. The most credible explanation for the bandgap values determined from photocurrent measurements is that the passive films are formed as dual layers, iron oxide outer layer and chromium oxide inner layer. This model does not need to evoke the potential dependent bandgaps used by previous authors.
机译:在金属和合金上形成的半导体无源膜的光电流和电容测量结果可用于研究电子性能并揭示有关结构和成分的间接信息。当前的工作使用这些技术来研究在硼酸盐中的三种奥氏体不锈钢(304L,316L和254SMO型)上形成的钝化膜的电子性能。已发现存在大量与非晶态氧化物一致的局部中带隙态。但是,发现奥氏体不锈钢钝化膜的平带电势与成分和测量频率均无关。由光电流测量确定的带隙值的最可靠解释是,钝化膜形成为双层,即氧化铁外层和氧化铬内层。该模型不需要引起先前作者使用的潜在的依赖带隙。

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