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Electrochemical and theoretical investigation of triazole derivatives on corrosion inhibition behavior of copper in hydrochloric acid medium

机译:三唑衍生物对盐酸介质中铜缓蚀性能的电化学和理论研究

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摘要

The inhibition effect of three triazole derivatives namely 4-amino-4H-l,2,4-triazole-3thiol (ATT), 4-amino-5-methyl-4H-l,2,4-triazole-3thiol (AMTT) and 4-amino-5-ethyl-4H-l,2,4-triazole-3thiol (AETT) have been investigated against the corrosion of copper in 0.5 M HC1 solution. The investigations were analyzed using potentiodynamic polarization, electrochemical impedance, weight loss methods and quantum chemical studies. Potentiodynamic polarization measurements indicate that all three examined compounds are cathodic type inhibitors. Among the studied compounds, 4-amino-5-ethyl-4H-l,2,4-tria-zole-3thiol exhibited the best inhibition efficiency 96.09% at 2.58 mM. The adsorption of these compounds obeyed the Langmuir adsorption isotherm. The electronic properties obtained using quantum chemical approach, were correlated with the experimental results.
机译:三种三唑衍生物的抑制作用分别为4-氨基-4H-1,2,4-三唑-3硫醇(ATT),4-氨基-5-甲基-4H-1,2,4-三唑-3硫醇(AMTT)和已经研究了4-氨基-5-乙基-4H-1,2,4-三唑-3硫醇(AETT)在0.5 M HCl溶液中对铜的腐蚀。使用电位动力学极化,电化学阻抗,失重方法和量子化学研究对研究进行了分析。电位动力学极化测量表明,所有三种检查的化合物均为阴极型抑制剂。在所研究的化合物中,4-氨基-5-乙基-4H-1,2,4-三唑-硫醇在2.58 mM时表现出最佳的抑制效率96.09%。这些化合物的吸附遵循Langmuir吸附等温线。使用量子化学方法获得的电子性质与实验结果相关。

著录项

  • 来源
    《Corrosion science》 |2013年第5期|161-169|共9页
  • 作者

    Sudheer; MA Quraishi;

  • 作者单位

    Department of Applied Chemistry, Indian Institute of Technology (Banaras Hindu University), Varanasi 221 005, India;

    Department of Applied Chemistry, Indian Institute of Technology (Banaras Hindu University), Varanasi 221 005, India;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    a. copper; a. acid solution; b. eis; b. polarization; c. interface;

    机译:一个。铜;a。酸性溶液;b。 eis;b。极化;c。接口;

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