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Corrosion product concentration in a single three-dimensional pit and the associated pitting dynamics

机译:单一三维坑和相关点蚀动力学中的腐蚀产品浓度

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摘要

A single three-dimensional pit was generated on one electrode at different polarization potentials, and its inner corrosion product concentration was evaluated by inductively coupled plasma emission spectrometry (ICP-OES) and three-dimensional microscope. The openness of pit increased with increasing pit volume and rising potential. The pit inner corrosion product concentration decreased with increasing pit volume and rising potential. Higher potentials resulted in a bigger pitting current density. Pit formed at higher potentials showed a lower pit inner corrosion product concentration and a faster growing rate, indicating that pit growth rate was mainly determined by applied potential rather than mass transfer process.
机译:在不同偏振电位的一个电极上产生单个三维坑,通过电感耦合等离子体发射光谱法(ICP-OES)和三维显微镜评估其内部腐蚀产品浓度。坑的开放性增加随着坑体积的增加和潜力上升。凹坑内腐蚀产物浓度随着坑体积的增加和潜力上升而降低。较高的电位导致了较大的蚀电流密度。在较高电位下形成的坑显示出较低的凹坑内腐蚀产品浓度和更快的生长速率,表明坑生长速率主要由施加的电位而不是传质过程确定。

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