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Passive film on 2205 duplex stainless steel studied by photo-electrochemistry and ARXPS methods

机译:通过光电化学和ARXPS方法研究2205双相不锈钢上的钝化膜

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摘要

The passive film formed on 2205 duplex stainless steel in pH 8.59 borate buffer solutions was studied by photo-electrochemical techniques and Mott-Schottky analysis. The passive film displays both n-type and p-type semiconductor character in different potential regions of the passive state. The band gap energy of barrier layer of the passive film was 2.4 similar to 2.75 eV. Additionally, the composition of passive film was analyzed by AR-XPS; at -400 similar to 100 mV(SCE) and above 600 mV(SCE) Fe2O3, Fe3O4, FeOOH and CrO3 dominate the passive film, showing n-type semi-conductivity; while at 100 similar to 600 mV(SCE) the passive film comprises FeO, Cr2O3 and Cr(OH)(3), exhibiting p-type semi-conductivity.
机译:通过光电化学技术和Mott-Schottky分析研究了在pH为8.59的硼酸盐缓冲溶液中在2205双相不锈钢上形成的钝化膜。无源膜在无源状态的不同电势区域中同时显示n型和p型半导体特性。无源膜的阻挡层的带隙能量为2.4,类似于2.75eV。另外,通过AR-XPS分析了无源膜的组成;在-400处,类似于100 mV(SCE)且在600 mV(SCE)以上,Fe2O3,Fe3O4,FeOOH和CrO3占主导地位,表现出n型半导电性。而在100时,类似于600 mV(SCE),钝化膜包含FeO,Cr2O3和Cr(OH)(3),表现出p型半导电性。

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