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Non-classical hydrosilane mediated reductions promoted by transition metal complexes

机译:过渡金属配合物促进非经典氢硅烷介导的还原

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This article reviews the most recent advances on the study of non-classical mechanisms for the reduction of organic substrates with hydrosilanes catalyzed by transition metals. A wide variety of catalytic cycles that go beyond the classical steps described for Ojima, Chalk-Harrod and modified Chalk-Harrod mechanisms, as representative examples, have been proposed in recent years. In this review, these alternative mechanistic proposals have been analyzed and classified according to the type of substrate, focusing on the reduction/hydrosilylation of carbonyl compounds (ketones and aldehydes), carbon dioxide, silylesters, amides, N-heterocycles, alkyl halides, nitriles, alkenes and alkynes. In spite of the broad diversity of non-classical reaction mechanisms hitherto reported, the catalytic cycles described for each substrate have been arranged in different categories according to their characteristics. The epigraph dedicated to the first type of substrate (carbonyl compounds) comprises most of the mechanisms described in this review for the reduction of polar bonds, which, to some extent, show a relationship to those proposed for non-polar bonds (alkenes and alkynes). Remarkable types of reaction mechanisms that will be dealt with in this work are: ionic mechanisms, ligand-assisted mechanisms, nonhydride mechanisms, NHC-Cu-H mediated mechanisms, and silylene-mediated mechanisms. (C) 2019 Elsevier B.V. All rights reserved.
机译:本文综述了过渡金属催化的氢硅烷还原有机底物的非经典机理研究的最新进展。近年来,已经提出了超过代表性的Ojima,Chalk-Harrod和改进的Chalk-Harrod机理的多种催化循环。在这篇综述中,已根据底物的类型对这些替代性的机械方案进行了分析和分类,重点是羰基化合物(酮和醛),二氧化碳,甲硅烷基酯,酰胺,N-杂环,烷基卤化物,腈的还原/氢化硅烷化,烯烃和炔烃。尽管迄今已报道了多种非经典反应机理,但针对每种底物描述的催化循环仍根据其特征分为不同的类别。专门针对第一类底物(羰基化合物)的题词包括本文中描述的大多数还原极性键的机理,在一定程度上表明与非极性键(烯烃和炔烃)的关系)。在这项工作中将要处理的显着类型的反应机理是:离子机理,配体辅助机理,非氢化物机理,NHC-Cu-H介导的机理和甲硅烷基介导的机理。 (C)2019 Elsevier B.V.保留所有权利。

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