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首页> 外文期刊>Collection of Czechoslovak Chemical Communications >ELECTROCHEMICAL CHARACTERISTICS OF AN INTERDIGITATED MICROBAND ELECTRODE ARRAY OF BORON-DOPED DIAMOND FILM
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ELECTROCHEMICAL CHARACTERISTICS OF AN INTERDIGITATED MICROBAND ELECTRODE ARRAY OF BORON-DOPED DIAMOND FILM

机译:掺硼金刚石薄膜微带电极阵列的电化学特性

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摘要

An microband electrode array (MBEA) of a boron-doped diamond (BDD) film was prepared by using the hot-filament chemical vapor deposition (HF-CVD) technique and micro-fabrication process with a standard photolithography technique. Electrochemical properties of a single MBEA (S-MBEA) and interdigitated MBEA (I-MBEA) of BDD film were studied by cyclic voltammetry (CV) analysis. Charge transfer characteristics were examined by electrochemical impedance spectra (EIS) analysis. A ferri-ferrocyanide redox system was chosen to act as the probe of one-electron transfer processes. The redox reaction was controlled by linear diffusion-limited transport at S-MBEA and quasi-steady-state non-linear diffusion at I-MBEA. A relation between current limit at I-MBEA and sweep rate was obtained with a correlation coefficient greater than 0.93. Hemispherical diffusion was primary at I-MBEA of BDD surface. There were two time constants for the S-MBEA and one time constant for the I-MBEA in the redox system. [PUBLICATION ABSTRACT]
机译:通过使用热丝化学气相沉积(HF-CVD)技术和采用标准光刻技术的微制造工艺,制备了硼掺杂金刚石(BDD)膜的微带电极阵列(MBEA)。通过循环伏安法(CV)分析研究了BDD膜的单个MBEA(S-MBEA)和指状MBEA(I-MBEA)的电化学性能。通过电化学阻抗谱(EIS)分析检查了电荷转移特性。选择亚铁-亚铁氰化物氧化还原系统作为单电子转移过程的探针。氧化还原反应受S-MBEA处的线性扩散限制输运和I-MBEA处的准稳态非线性扩散控制。 I-MBEA处的电流极限与扫描速率之间的关系以大于0.93的相关系数获得。半球形扩散主要发生在BDD表面的I-MBEA处。在氧化还原系统中,S-MBEA有两个时间常数,I-MBEA有一个时间常数。 [出版物摘要]

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    Wei ZHANG(a1,b,*), Shaoai XIE(a2), Mei LI(a5), Hongjin CHEN(a4), Li MA(a5) and Jinping JIA(b1,*)a School of Chemistry and Chemical Technology, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai, 200240, P. R. China, e-mail: 1 weizhang@sjtu.edu.cn, 2 xie-shaoai@163.com, 3 meili@situ.edu.cn, 4 chenhi@sftu.edu.cn, 5 mali@situ.edu.cnb School of Environmental Science and Engineering, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai, 200240, P. R. China, e-mail: 1 jinpingjia@126.comReceived July 12, 2008Accepted October 2, 2008Published online February 24, 2009,;

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