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Pulsed Plasma Polymerization of Tetramethyltin: Nanoscale Compositional Control of Film Chemistry

机译:四甲基锡的脉冲等离子体聚合:膜化学的纳米组成控制。

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摘要

The pulsed plasma polymerization of tetramethyltin monomer was studied as a function of the radio frequency (rf) duty cycle employed, all other plasma variables being held constant. Progressive increases in the relative tin content of the plasma deposited films were observed with systematic decreases in the rf duty cycles employed during film formation. The variations in tin content of these films were documented by XPS, FT-IR, TEM, AFM, and electrochemical analyses. A particularly interesting aspect of this work is the microstructure of the films which reveals spherical tin particles of essentially uniform diameters (20-30 nm) independent of the duty cycle during deposition. The increasing metal content in these films with decreasing duty cycle corresponds to increased aggregation of these nanosized particles into progressively larger sized clusters. The results obtained are supportive of the use of the variable duty cycle pulsed plasma deposition technique as a new route to improved nanoscale film chemistry control in the synthesis of organometallic composite films.
机译:研究了四甲基锡单体的脉冲等离子体聚合与所用射频(rf)占空比的关系,所有其他等离子体变量保持恒定。观察到等离子体沉积膜的相对锡含量逐渐增加,而在膜形成过程中采用的rf占空比却有系统地降低。这些薄膜中锡含量的变化已通过XPS,FT-IR,TEM,AFM和电化学分析证明。这项工作的一个特别有趣的方面是薄膜的微观结构,揭示了直径基本均匀的球形锡颗粒(20-30 nm),与沉积过程中的占空比无关。这些膜中的金属含量随着占空比的降低而增加,对应于这些纳米尺寸颗粒向更大尺寸簇的逐渐聚集。获得的结果支持可变占空比脉冲等离子体沉积技术作为有机金属复合膜合成中改善纳米级膜化学控制的新途径的使用。

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