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Effect of bias voltage on microstructure and mechanical properties of arc evaporated (Ti, Al)N hard coatings

机译:偏压对电弧蒸发(Ti,Al)N硬质涂层微观结构和力学性能的影响

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摘要

In the present study, authors report on the effect that substrate bias voltage has on the microstructure and mechanical properties of (Ti, Al)N hard coatings deposited with cathodic arc evaporation (CAE) technique. The coatings were deposited from a Ti 0· 5Al 0· 5 powder metallurgical target in a reactive nitrogen atmosphere at three different bias voltages: U B  = −  25, −50 and −100 V. The coatings were characterized in terms of compositional, microstructural and mechanical properties. Microstructure of the coatings was investigated with the aid of X-ray diffraction in glancing angle mode, which revealed information on phase composition, crystallite size, stress-free lattice parameter and residual stress. Mechanical properties were deduced from nano-indentation measurements. The residual stress in all the coatings was compressive and increased with increasing bias voltage in a manner similar to that reported in literature for Ti–Al–N coatings deposited with CAE. The bias voltage was also found to significantly influence the phase composition and crystallite size. At −25 V bias voltage the coating was found in single phase fcc-(Ti, Al)N and with relatively large crystallites of ~ 9 nm. At higher bias voltages (−50 and −100 V), the coatings were found in dual phase fcc-(Ti, Al)N and fcc-AlN and the size of crystallites reduced to approximately 5 nm. The reduction of crystallite size and the increase of compressive residual stress with increasing bias voltage both contributed to an increase in hardness of the coatings.
机译:在本研究中,作者报告了基材偏压对采用阴极电弧蒸发(CAE)技术沉积的(Ti,Al)N硬质涂层的组织和力学性能的影响。涂层是从Ti 0·5Al 0·5粉末冶金靶材在活性氮气氛中以三种不同的偏置电压UB = − 25,-50和-100 V沉积的。涂层的成分,微观结构和特性机械性能。借助掠射角模式的X射线衍射研究了涂层的微观结构,该涂层揭示了相组成,微晶尺寸,无应力晶格参数和残余应力的信息。机械性能是从纳米压痕测量得出的。所有涂层中的残余应力都是压缩性的,并且随着偏压的增加而增加,其方式与文献报道的用CAE沉积的Ti-Al-N涂层相似。还发现偏置电压显着影响相组成和微晶尺寸。在-25V偏置电压下,发现涂层处于单相fcc-(Ti,Al)N中,并且具有约9 nm的相对较大的微晶。在较高的偏置电压(-50和-100 V)下,发现涂层为双相fcc-(Ti,Al)N和fcc-AlN,微晶尺寸减小到约5 nm。微晶尺寸的减小和随着残余电压的增加而残余压缩应力的增加都有助于涂层硬度的增加。

著录项

  • 来源
    《Bulletin of Materials Science》 |2013年第3期|429-435|共7页
  • 作者

    F ALIAJ; N SYLA; S AVDIAJ; T DILO;

  • 作者单位

    Department of Physics Faculty of Mathematical and Natural Sciences University of Prishtina">(1);

    Department of Physics Faculty of Mathematical and Natural Sciences University of Prishtina">(1);

    Department of Physics Faculty of Mathematical and Natural Sciences University of Prishtina">(1);

    Department of Physics Faculty of Natural Sciences University of Tirana">(2);

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Hard coatings; cathodic arc evaporation; GAXRD; hardness; (Ti, Al)N;

    机译:硬涂层;阴极电弧蒸发GAXRD;硬度;(钛;铝)N;

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