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Atomic layer deposited conformal ceramic coatings for anti-corrosion of Ag nanoparticles

机译:原子层沉积的Ag纳米粒子的防腐保形陶瓷涂层

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The goal of this work is to explore atomic layer deposition (ALD) as a thin film coating technique to inhibit corrosion of metal nanoparticles, given the technique's ability to form a conformal coating on high aspect ratio substrates. Various coating materials, including Al2O3, ZrO2, HfO2, and TiO2 of different thicknesses were coated on Ag nanoparticles (NPs) in a fluidized bed ALD reactor. To avoid sintering of Ag NPs during the ALD process, the reaction temperature was set to 100 degrees C, lower than typical ALD reaction temperatures for these metal oxides. The ultrathin coatings (up to similar to 10 nm thick) were conformally deposited on the surface of Ag NPs. During the corrosion tests in a neutral 3.5 wt% NaCl solution, the corrosion current density was lowered by more than one order of magnitude; in an acid 0.5 M H2SO4 solution, the stabilities of different thin coatings were compared. Ultraviolet-visible spectra of coated Ag NPs showed retention of surface plasmonic resonance.
机译:这项工作的目的是探讨原子层沉积(ALD)作为薄膜涂层技术,以抑制金属纳米颗粒的腐蚀,因为该技术在高纵横比基材上形成共形涂层的能力。在流化床ALD反应器中的Ag纳米颗粒(NPS)上涂覆不同厚度的各种涂料,包括Al 2 O 3,ZrO 2,HfO 2和TiO 2。为了避免在ALD过程中烧结Ag NP,将反应温度设定为100℃,低于这些金属氧化物的典型ALD反应温度。超薄涂层(最高可达10nm厚)在Ag nps的表面上叠形地沉积。在中性为3.5wt%NaCl溶液中的腐蚀试验期间,腐蚀电流密度降低了多个数量级;在酸0.5MH2SO4溶液中,比较了不同薄涂层的稳定性。涂层Ag NP的紫外易型光谱显示出表面等离子体共振的保留。

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