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Controlled ultra-thin oxidation of graphite promoted by cobalt oxides: Influence of the initial 2D CoO wetting layer

机译:通过钴氧化物促进的石墨的控制超薄氧化:初始2D CoO润湿层的影响

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摘要

The interaction of CoO with highly oriented pyrolytic graphite (HOPG) was studied using a set of complementary techniques. The morphology of the CoO thin film was determined using atomic force microscopy (AFM), whereas the electronic structure was investigated using X-ray absorption (XAS) and photoemission (PES) spectroscopies. The experimental spectra were analyzed using a configuration interaction CoO6 cluster model calculation. The early stages of growth are characterized by the formation of a CoO wetting layer at the CoO/HOPG interface. The electronic structure of the CoO wetting layer presents a clear 2D character, which is closer to the 2D HOPG substrate than to the 3D CoO bulk. This character of the wetting layer explains the posterior formation of CoO islands and excludes the alternative layer by layer growth mode. Further, the interaction between the CoO wetting layer and the outermost graphite layer favors the oxidation of the HOPG substrate which can be controlled by the thickness of the deposited CoO overlayer.
机译:使用一组互补技术研究了COO与高度取向热解石墨(HOPG)的相互作用。使用原子力显微镜(AFM)测定CoO薄膜的形态,而使用X射线吸收(XAS)和光曝光(PES)光谱研究了电子结构。使用配置交互COO6集群模型计算分析实验光谱。增长的早期阶段的特征在于在COO / HOPG界面中形成COO润湿层。 COO润湿层的电子结构呈现出透明的2D特征,其比到2D跳底孔更靠近3D CoO散装。润湿层的这种特征解释了CoO岛的后部形成,并通过层生长模式排除替代层。此外,COO润湿层与最外层石墨层之间的相互作用有利于跳动衬底的氧化,该跳动基板可以通过沉积的COO覆盖层的厚度来控制。

著录项

  • 来源
    《Applied Surface Science》 |2020年第15期|145118.1-145118.9|共9页
  • 作者单位

    Univ Autonoma Madrid Dept Fis Aplicada Francisco Tomas & Valiente 7 E-28049 Madrid Spain|Univ Autonoma Madrid Inst Ciencia Mat Nicolas Cabrera Francisco Tomas & Valiente 7 E-28049 Madrid Spain;

    Univ Autonoma Madrid Dept Fis Aplicada Francisco Tomas & Valiente 7 E-28049 Madrid Spain|Univ Autonoma Madrid Inst Ciencia Mat Nicolas Cabrera Francisco Tomas & Valiente 7 E-28049 Madrid Spain;

    Univ Fed Parana Dept Fis Caixa Postal 19044 BR-81531990 Curitiba Parana Brazil;

    Univ Fed Parana Dept Fis Caixa Postal 19044 BR-81531990 Curitiba Parana Brazil;

    CSIC ICMM Sor Juana Ines de la Cruz 3 E-28049 Madrid Spain;

    ALBA Synchrotron Carrer Llum 2-26 Barcelona 08290 Spain;

    ALBA Synchrotron Carrer Llum 2-26 Barcelona 08290 Spain;

    CSIC ICMM Sor Juana Ines de la Cruz 3 E-28049 Madrid Spain|BM25 SpLine ESRF 71 Ave Martyrs F-38043 Grenoble France;

    Univ Autonoma Madrid Dept Fis Aplicada Francisco Tomas & Valiente 7 E-28049 Madrid Spain|Univ Autonoma Madrid Inst Ciencia Mat Nicolas Cabrera Francisco Tomas & Valiente 7 E-28049 Madrid Spain;

    Univ Autonoma Madrid Dept Fis Aplicada Francisco Tomas & Valiente 7 E-28049 Madrid Spain|Univ Autonoma Madrid Inst Ciencia Mat Nicolas Cabrera Francisco Tomas & Valiente 7 E-28049 Madrid Spain;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CoO/HOPG interfaces; Wetting layers; HOPG oxidation; X-ray photoemission spectroscopies; X-ray absorption spectroscopies;

    机译:COO / HOPG界面;润湿层;跳跃氧化;X射线照相激光谱;X射线吸收光谱;

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