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首页> 外文期刊>Applied Surface Science >Suppression of the green emission, texturing, solute-atom diffusion and increased electron-phonon coupling induced by Ni in sol-gel ZnNiO thin films
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Suppression of the green emission, texturing, solute-atom diffusion and increased electron-phonon coupling induced by Ni in sol-gel ZnNiO thin films

机译:溶胶-凝胶ZnNiO薄膜中Ni诱导的绿色发射,织构化,溶质原子扩散和增强的电子-声子耦合的抑制

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Zn1-xNixO thin films (nominal x = 0, 0.01, 0.02, 0.04, 0.1 and 0.2) were synthesized on silicon substrates through a sol-gel/dip-coating technique. Samples were studied by X-ray diffraction, scanning electron microscopy, photoluminescence spectroscopy, Rutherford backscattering spectrometry and depth-profiling X-ray photoelectron spectroscopy. The results from X-ray diffraction show growth in the wurtzite crystal structure for all samples, with cubic NiO being detected as a secondary phase for x = 0.2. While for x = 0 (pure ZnO) no texture is present, for 0 = x = 0.1 strong preferential crystallization along the c-axis is observed. A tendency for Ni diffusion towards the film/Si substrate interface was observed. The formation of substitutional ZnxNi1-xO solid solution for 0.01 = x = 0.04 is suggested by the results. Photoluminescence spectra exhibit strong near band edge UV emission and suppression of deep defect-related emission in the visible upon Ni+2 incorporation into the ZnO lattice. As in pure ZnO, the UV emission in ZnNiO at room temperature is dominated by the first two phonon replica of the excitonic emission, however the LO phonon energy (h omega(LO)) is reduced by up to similar to 15 meV in the 0 = x = 0.04 range. Due to this reduction of h omega(LO), the exciton-phonon coupling increases, in consistency with a corresponding expected increase of the Frohlich coupling constant with decreasing h omega(LO).
机译:通过溶胶-凝胶/浸涂技术在硅基板上合成了Zn1-xNixO薄膜(标称x = 0、0.01、0.02、0.04、0.1和0.2)。通过X射线衍射,扫描电子显微镜,光致发光光谱,卢瑟福背散射光谱和深度分析X射线光电子光谱对样品进行了研究。 X射线衍射的结果表明,所有样品的纤锌矿晶体结构均发生了增长,立方x Ni被检测为x = 0.2的第二相。当x = 0(纯ZnO)时不存在织构,而对于0 <= x <= 0.1,则沿c轴观察到强烈的优先结晶。观察到Ni向膜/ Si衬底界面扩散的趋势。结果表明形成了0.01 <= x <= 0.04的替代ZnxNi1-xO固溶体。当Ni + 2掺入ZnO晶格中时,光致发光光谱显示出较强的近带边缘UV发射,并抑制了可见光中与缺陷有关的深层发射。与纯ZnO一样,室温下ZnNiO中的UV发射受激子发射的前两个声子副本控制,但是LO声子能量(h omega(LO))降低了0到15 meV。 <= x <= 0.04范围。由于hω(LO)的这种降低,激子-声子耦合增加,这与随着hω(LO)的降低而Frohlich耦合常数的相应预期增加相一致。

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