首页> 外文期刊>Applied Surface Science >Ab initio pseudopotential calculations for the electronic and geometric structures of hydrogen covered Si(114)-(2 x 1)
【24h】

Ab initio pseudopotential calculations for the electronic and geometric structures of hydrogen covered Si(114)-(2 x 1)

机译:氢覆盖Si(114)-(2 x 1)的电子和几何结构的从头算伪势计算

获取原文
获取原文并翻译 | 示例
           

摘要

Using a first principles pseudopotential method we have studied the adsorption of H on the high index Si(1 1 4)-(2 x 1) surface within the local density approximation. This stable surface is found to be both chemically and electronically passivated by two different coverages of hydrogen: 1.0 ML and 1.5 ML. For the 1.0 ML coverage all the A- and B-type dimer bond lengths have equalised to 2.40 Angstrom and the rebonded lengths are slightly longer at 2.48 Angstrom. Hydrogen passivation, for both coverages. leads the surface bands of the clean Si(1 1 4)-(2 x 1) surface to move into the bulk valence and conduction bands. Differences in the density of states for the clean, 1.0 ML and 1.5 ML coverages were observed and are discussed. (C) 2004 Elsevier B.V. All rights reserved.
机译:使用第一原理拟电位方法,我们研究了H在局部密度近似值内在高折射率Si(1 1 4)-(2 x 1)表面上的吸附。发现该稳定表面被两种不同的氢覆盖率化学和电子钝化:1.0 ML和1.5 ML。对于1.0 ML的覆盖范围,所有A型和B型二聚体键的长度均等于2.40埃,重新键合的长度稍长一些,为2.48埃。氢钝化,适用于两种情况。导致干净的Si(1 1 4)-(2 x 1)表面的表面带移至体价带和导带。观察并讨论了清洁,1.0 ML和1.5 ML覆盖范围的状态密度差异。 (C)2004 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号