首页> 外文期刊>Applied Surface Science >Magnetotransport properties and the annealing effect of (Ga,Mn)As/Si heterostructures and substrate-free (Ga,Mn)As films
【24h】

Magnetotransport properties and the annealing effect of (Ga,Mn)As/Si heterostructures and substrate-free (Ga,Mn)As films

机译:(Ga,Mn)As / Si异质结构和无衬底(Ga,Mn)As薄膜的磁输运性质和退火效应

获取原文
获取原文并翻译 | 示例
       

摘要

We investigated the properties and annealing effects of substrate-free (Ga,Mn)As films prepared by etching Si substrates from (Ga,Mn)As/Si structures, and compared the results with those from (Ga,Mn)As/Si heterostructures. The substrate-free (Ga,Mn)As films with 6% Mn content were annealed at 250 degreesC as a function of time. From Hall-effect measurements, the Curie temperature of substrate-free (Ga,Mn)As films was estimated to be 87 K for an as-grown film, enhanced up to 152 K after low-temperature annealing for 60 min. We found that the (Ga,Mn)As films grown on Si substrates show a relatively high Curie temperature. (C) 2004 Elsevier B.V. All rights reserved.
机译:我们研究了通过蚀刻从(Ga,Mn)As / Si结构的Si衬底制备的无衬底(Ga,Mn)As膜的性能和退火效果,并将结果与​​(Ga,Mn)As / Si异质结构的结果进行了比较。将Mn含量为6%的无基板(Ga,Mn)As膜在250℃下随时间退火。根据霍尔效应测量,对于生长后的薄膜,无衬底(Ga,Mn)As薄膜的居里温度估计为87 K,在低温退火60分钟后提高到152K。我们发现,在硅衬底上生长的(Ga,Mn)As薄膜显示出较高的居里温度。 (C)2004 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号