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Effect of Al content on the properties of Cr1-xAlxC films prepared by RF reactive magnetron sputtering

机译:Al含量对RF反应磁控溅射制备Cr1-xAlxC薄膜性能的影响

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Cr1-chi Al chi C films were deposited on high-speed steel by RF reactive magnetron sputtering. In this study, we aimed to identify the effect of the Al content on the properties of Cr1-chi Al chi C films. We found that Cr1-chi Al chi C films exhibited a fine columnar grain microstructure with some special characteristics, such as high hardness of Hv 1426, a low friction coefficient of 0.29, and a large contact angle of 90 degrees for x = 0.18. Furthermore, an increase in Al content resulted in a decrease in film hardness and an increase in contact angle. Moreover, on annealing at 923 K, the mechanical properties of the films improved and a dense protective film of complex Cr2O3 and Al2O3 oxides was formed on the surface for better wear resistance, which will ultimately increase the lifetime of the high-speed steel substrate. (c) 2006 Elsevier B.V. All rights reserved.
机译:通过射频反应磁控溅射在高速钢上沉积Cr1-chi Al chi C膜。在这项研究中,我们旨在确定Al含量对Cr1-chi Al chi C薄膜性能的影响。我们发现Cr1-chi Al chi C膜表现出细小的柱状晶粒组织,具有一些特殊的特性,例如Hv 1426的高硬度,0.29的低摩擦系数和x = 0.18的90度大接触角。此外,Al含量的增加导致膜硬度的降低和接触角的增大。此外,在923 K退火时,薄膜的机械性能得到改善,并且在表面上形成了复合的Cr2O3和Al2O3氧化物致密的保护膜,具有更好的耐磨性,这最终将提高高速钢基材的寿命。 (c)2006 Elsevier B.V.保留所有权利。

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