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Synthesis and characterization of single- and co-doped SnO_2 thin films for optoelectronic applications

机译:用于光电应用的单掺杂和共掺杂SnO_2薄膜的合成与表征

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Doped SnO_2 thin films have been prepared by sputtering from two different targets: antimony doped tin oxide (ATO) and antimony and zinc doped tin oxide (AZTO). In the case of ATO ceramic, the antimony amount only reaches 0.012 mol per formula unit due to its evaporation at high temperature while the presence of Zn~(2+) in AZTO prevents the antimony evaporation, greatly enhances the ceramic density and allows the deposition of thin films with a high deposition rate. Both types of thin films have a dense morphology with a smooth surface and they are polycrystalline. For post-annealed ATO thin films, the Drude model was applied to deduce the carrier concentration, the optical mobility as well as the resistivity. The carrier concentration is around ten times higher for ATO thin films compared to AZTO. The two combined effects (higher carrier concentration and mobility) for ATO thin films doped with 1.2% of Sb lead to the best optoelectronic performances, confirming previous results obtained with ceramics. Nevertheless, we have a better opportunity to modulate the conductivity in the case of AZTO thin films.
机译:通过溅射从两个不同的靶材制备了掺杂的SnO_2薄膜:锑掺杂的氧化锡(ATO)和锑锌掺杂的氧化锡(AZTO)。在ATO陶瓷的情况下,由于其在高温下的蒸发,锑的量仅达到每配方单位0.012 mol,而AZTO中Zn〜(2+)的存在阻止了锑的蒸发,大大提高了陶瓷的密度并允许沉积具有高沉积速率的薄膜。两种类型的薄膜都具有致密的形态和光滑的表面,并且它们是多晶的。对于后退火的ATO薄膜,采用Drude模型来推导载流子浓度,光学迁移率以及电阻率。与AZTO相比,ATO薄膜的载流子浓度大约高十倍。掺杂有1.2%Sb的ATO薄膜的两种综合效果(较高的载流子浓度和迁移率)共同带来了最佳的光电性能,这证实了以前用陶瓷获得的结果。但是,对于AZTO薄膜,我们有更好的机会来调节电导率。

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