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Fabrication of nanostructured CuInS_2 thin films by ion layer gas reaction method

机译:离子层气相反应法制备纳米结构的CuInS_2薄膜

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CuInS_2 thin films were prepared by a two-stage ion layer gas reaction (ILGAR) process in which the Cu and In precursors were deposited on glass substrate by using a simple and low-cost dip coating technique and annealed in H_2S atmosphere at different temperatures. The influence of the annealing temperature (250-450 ℃) on the particle size, crystal structure and optical properties of the CuInS_2 thin films was studied. Transmission electron microscopy revealed that the particle radii varied in the range 6-21 nm with annealing. XRD and SAED patterns indicated polycrystalline nature of the nanoparticles. The optical band gap (E_g) varied from 1.48 to 1.56 eV with variation of particle size. The variation of Urbach tail with temperature indicated higher density of the defects for the films annealed at lower temperature. From the Raman study, it was observed that the FWHM of the A_1 mode at ~292 cm~(-1) corresponding to the chalcopyrite phase of CuInS_2 decreased with increasing annealing temperature.
机译:CuInS_2薄膜是通过两阶段离子层气相反应(ILGAR)工艺制备的,该工艺采用简单且低成本的浸涂技术将Cu和In前体沉积在玻璃基板上,并在不同温度的H_2S气氛中进行退火。研究了退火温度(250-450℃)对CuInS_2薄膜的粒径,晶体结构和光学性能的影响。透射电子显微镜显示,随着退火,粒子半径在6-21nm范围内变化。 XRD和SAED图谱表明纳米颗粒具有多晶性质。光学带隙(E_g)从1.48 eV到1.56 eV,随粒径变化。 Urbach尾部随温度的变化表明在较低温度下退火的薄膜的缺陷密度较高。从拉曼研究中可以看出,随着退火温度的升高,与CuInS_2的黄铜矿相对应的292 cm〜(-1)处的A_1模式的半峰宽减小。

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