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Electron microscopic study on interfacial characterization of electroless Ni-W-P plating on aluminium alloy

机译:铝合金化学镀Ni-W-P界面特性的电子显微镜研究

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摘要

The interface between electroless plating Ni-W-P deposit and aluminium alloy (Al) matrix at different temperature heated for 1 h was studied using transmission electron microscope. The results show that the interface between as-deposited Ni-W-P deposit and Al matrix is clear. There are no crack and cavity. The bonding of Ni-W-P deposit and Al matrix is in good condition. The Ni-W-P plating is nanocrystalline phase (5-6 nm) in diameter. After being heated at 200 ℃ for 1 h, the interface of Ni-W-P deposit and Al matrix is clear, without the appearance of the diffusion layer. There exist a diffusion layer and educts of intermetallic compounds of nickle and aluminium such as Al_3Ni, Al_3Ni_2, NiAl, Ni_5Al_3 and so on between Ni-W-P deposit and Al matrix after being heated at 400 ℃ for 1 h.
机译:利用透射电子显微镜研究了在不同温度下加热1 h的化学镀Ni-W-P沉积物与铝合金(Al)基体之间的界面。结果表明,沉积态Ni-W-P沉积物与Al基体之间的界面清晰。没有裂纹和空腔。 Ni-W-P沉积物与Al基体的结合状况良好。 Ni-W-P镀层的直径为纳米晶相(5-6 nm)。在200℃加热1 h后,Ni-W-P沉积物与Al基体的界面清晰,没有扩散层的出现。在400℃下加热1h后,Ni-W-P镀层与Al基体之间形成了镍与铝的金属间化合物的扩散层和析出物,如Al_3Ni,Al_3Ni_2,NiAl,Ni_5Al_3等。

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