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Characterization of In/Pd and Pd/In/Pd thin films by ellipsometric, XRD and AES methods

机译:通过椭偏,XRD和AES方法表征In / Pd和Pd / In / Pd薄膜

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摘要

In/Pd and Pd/In/Pd thin films were prepared by thermal evaporation on the SiO_2 substrate in a vacuum. The structural and optical properties of the films were investigated by means of X-ray diffractometry (XRD), Auger electron spectroscopy (AES) and spectroscopic ellipsometry (SE). Auger depth profile studies were performed in order to determine the composition of elements in the Pd-In systems. Interdiffusion of metals was detected at room temperature. Optical properties of Pd-In composite layers formed due to the interdiffusion were derived from ellipsometric quantities Ψ and Δ measured in the photon energy range 0.75-6.50 eV at different angles of incidence. The effective optical spectra show absorption peaks dependent on the composition of nonuniform films. The XRD patterns indicated formation of Pd_(1-x)In_x intermetallic phases in the samples.
机译:通过在真空下在SiO_2衬底上热蒸发来制备In / Pd和Pd / In / Pd薄膜。通过X射线衍射法(XRD),俄歇电子能谱法(AES)和椭圆偏振光谱法(SE)研究了膜的结构和光学性质。为了确定Pd-In系统中元素的组成,进行了俄歇深度剖面研究。在室温下检测到金属的相互扩散。由于相互扩散而形成的Pd-In复合层的光学特性是由在不同入射角在0.75-6.50 eV的光子能量范围内测得的椭圆光度quantities和Δ得出的。有效光谱显示吸收峰取决于不均匀膜的组成。 XRD图谱表明样品中形成了Pd_(1-x)In_x金属间相。

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