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Transparent conducting molybdenum-doped zinc oxide films deposited by RF magnetron sputtering

机译:射频磁控溅射沉积透明掺杂钼的氧化锌薄膜

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摘要

A new transparent conducting oxide (TCO) film with low resistivity and high transmittance in the visible range, molybdenum-doped zinc oxide (MZO), was successfully prepared by RF magnetron sputtering method on glass substrates at room temperature. The structural, electrical, and optical properties as a function of film thickness were investigated. All the samples have a preferred orientation with the (0 0 2) planes parallel to the substrates. The resistivity initially decreases and then shows an increase with the increase of the film thickness. When the thickness is 400 nm, the film has its best crystallinity and lowest resistivity 9.2 × 10~(-4) Ω cm with a Hall mobility of 30 cm~2 V~(-1) s~(-1) and a carrier concentration of 2.3 × 10~(20) cm~(-3). The average transmittance in the visible range exceeds 84% for all thickness films.
机译:通过射频磁控溅射方法,在室温下成功地在玻璃衬底上制备了一种新型的透明导电氧化物(TCO)薄膜,该薄膜在可见光范围内具有低电阻率和高透射率。研究了结构,电学和光学性能随膜厚的变化。所有样品均具有优选的取向,其中(0 0 2)平面平行于基材。电阻率最初随着膜厚度的增加而降低,然后显示出增加。当厚度为400 nm时,薄膜具有最佳结晶度和最低电阻率,为9.2×10〜(-4)Ωcm,霍尔迁移率为30 cm〜2 V〜(-1)s〜(-1),并且具有载流子浓度为2.3×10〜(20)cm〜(-3)。对于所有厚度的膜,可见光范围内的平均透射率均超过84%。

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