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Smooth Nb surfaces fabricated by buffered electropolishing

机译:通过缓冲电抛光制造的光滑Nb表面

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It was demonstrated that smooth Nb surfaces could be obtained through buffered electropolishing (BEP) employing an electrolyte consisting of lactic, sulfuric, and hydrofluoric acids. Parameters that control the polishing process were optimized to achieve a smooth surface finish. The polishing rate of BEP was determined to be 0.646 μm/min which was much higher than 0.381 μm/min achieved by the conventional electropolishing (EP) process widely used in the superconducting radio frequency (SRF) community. Root mean square measurements using a 3D profilometer revealed that Nb surfaces treated by BEP were an order of magnitude smoother than those treated by the optimized EP process. The chemical composition of the Nb surfaces after BEP was analyzed by static and dynamic secondary ion mass spectrometry (SIMS) systems. SIMS results implied that the surface oxide structure of Nb might be more complicated than what usually believed and could be inhomogeneous. Preliminary results of BEP on Nb SRF single cell cavities and half-cells were reported. It was shown that smooth and bright surfaces could be obtained in 1800 s when the electric field inside a SRF cavity was uniform during a BEP process. This study showed that BEP is a promising technique for surface treatment on Nb SRF cavities to be used in particle accelerators.
机译:结果表明,通过使用由乳酸,硫酸和氢氟酸组成的电解质进行缓冲电抛光(BEP),可以获得光滑的Nb表面。优化了控制抛光过程的参数,以实现光滑的表面光洁度。 BEP的抛光速率确定为0.646μm/ min,远高于超导射频(SRF)社区中广泛使用的常规电抛光(EP)工艺获得的0.381μm/ min。使用3D轮廓仪测量的均方根表明,经BEP处理的Nb表面比经优化的EP工艺处理的Nb表面光滑一个数量级。通过静态和动态二次离子质谱(SIMS)系统分析了BEP后Nb表面的化学成分。 SIMS结果表明,Nb的表面氧化物结构可能比通常认为的更为复杂,并且可能是不均匀的。报道了BEP对Nb SRF单细胞腔和半细胞的初步结果。结果表明,当BEP过程中SRF腔内的电场均匀时,可以在1800 s内获得光滑明亮的表面。这项研究表明,BEP是一种用于粒子加速器的Nb SRF腔表面处理的有前途的技术。

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