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Surface Chemistry Study Of Mn-doped Germanium Nanowires

机译:锰掺杂锗纳米线的表面化学研究

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Single crystal germanium nanowires have been grown by vapour-liquid-solid deposition onto silicon oxide substrates with Au catalyst nanoparticles. They have been doped by two different techniques: Ge and Mn co-evaporation during growth and post-growth Mn implantation. Scanning electron microscopy images show that Mn-implanted nanowires have a lower surface density and a smaller average diameter (18.8 nm) than the un-doped ones and those Mn doped by co-deposition. The effectiveness of Mn doping has been verified by X-ray photoemission spectroscopy and by energy-dispersive X-ray measurements, indicating in the two cases significant Mn atomic concentration in the nanowire. X-ray diffraction indicates that the nanowires are single crystals and that they do not contain precipitates of Mn extrinsic phases. Both SEM and XPS experimental evidences are in line to indicate that the Mn doping by ion implantation is preferable with respect to that one performed by co-evaporation as it reduces the thickness of the outer oxide sheath of the nanowires and their diameter.
机译:单晶锗纳米线已经通过汽-液-固沉积在具有Au催化剂纳米颗粒的氧化硅衬底上生长。它们已经通过两种不同的技术进行了掺杂:生长期间的Ge和Mn共蒸发以及生长后的Mn注入。扫描电子显微镜图像显示,与未掺杂和通过共沉积掺杂的Mn相比,注入Mn的纳米线具有更低的表面密度和更小的平均直径(18.8 nm)。 Mn掺杂的有效性已通过X射线光电子能谱和能量色散X射线测量得到了验证,表明在两种情况下纳米线中的Mn原子浓度都很高。 X射线衍射表明,纳米线是单晶,并且它们不包含Mn非本征相的沉淀。 SEM和XPS实验证据均表明,通过离子注入进行的Mn掺杂相对于通过共蒸发进行的Mn掺杂更可取,因为它减少了纳米线的外部氧化物护套的厚度及其直径。

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