首页> 外文期刊>Applied Surface Science >Growth And Characterization Of Zno-sds Hybrid Thin Films Prepared By Electrochemical Self-assembly Method
【24h】

Growth And Characterization Of Zno-sds Hybrid Thin Films Prepared By Electrochemical Self-assembly Method

机译:电化学自组装法制备Zno-sds杂化薄膜的生长与表征

获取原文
获取原文并翻译 | 示例
       

摘要

ZnO-SDS hybrid thin films were grown on ITO glass using the potentiostatic electrodeposition route from aqueous zinc nitrate solution containing surfactant sodium dodecyle sulfanate (SDS). The electrochemical process of the hybrid films was analyzed by comparing the cyclic voltammetric curve and current-time curve with those of pure ZnO film. Results showed that the addition of a small amount of SDS could decrease the deposition current density, and inhibit the growth of ZnO crystals significantly. The hybrid films electrodeposited at -0.9 V for 30 min exhibited smooth and platelet-like morphology, with the film thickness of about 110 nm. The well-defined ZnO-SDS lamellar structures could be clearly observed, with two interlayer spaces of 35.1 and 30.9 A, respectively. Optical analysis showed that the hybrid films had good optical quality, and exhibited the fundamental absorption edge of ZnO at 380 nm.
机译:ZnO-SDS杂化薄膜是利用恒电位电沉积方法从含有表面活性剂十二烷基磺酸钠(SDS)的硝酸锌水溶液中在ITO玻璃上生长的。通过将循环伏安曲线和电流时间曲线与纯ZnO薄膜的电化学伏安曲线和电流时间曲线进行比较,分析了杂化薄膜的电化学过程。结果表明,添加少量的SDS可以降低沉积电流密度,并显着抑制ZnO晶体的生长。在-0.9 V下电沉积30分钟的杂化膜表现出光滑和片状的形态,膜厚约110 nm。清晰可见的ZnO-SDS层状结构清晰可见,两个夹层空间分别为35.1和30.9A。光学分析表明该杂化膜具有良好的光学质量,并在380 nm处具有ZnO的基本吸收边。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号