机译:激光处理氧化钒薄膜的XRD和XPS分析
CRMC-N, UPR 7251 CNRS, Universite de la Mediterranee, Case 901, 13288 Marseille Cedex 9, France University of Szeged, Department of Otolaryngology, Faculty of Medicine, Tisza Lajos krt. 111, H-6725 Szeged, Hungary RIKEN - The Institute of Physical and Chemical Research, Wako, Saitama 351-0198, Japan;
University of Szeged, Supramolecular and Nanostructured Materials Research Croup of the Hungarian Academy of Sciences, H-6720 Szeged, Hungary;
University of Szeged, Supramolecular and Nanostructured Materials Research Croup of the Hungarian Academy of Sciences, H-6720 Szeged, Hungary;
Department of Solid State and Radiochemistry, University of Szeged, Aradi Vt1, H-6720 Szeged, Hungary;
University of Szeged, Department of Physics, JCYTFK, H-6720 Szeged, Hungary;
vanadium oxide thin films; sol-gel process; laser radiation; X-ray photoelectron spectroscopy;
机译:激光束辐照二氧化钒和五氧化二钒薄膜的动态光学极限实验
机译:激光束辐照的二氧化钒和五氧化二钒薄膜的动态光学极限实验
机译:在钒金属上生长的氧化钒薄膜:氧化条件以生产用于Li嵌入应用的V2O5膜,并通过XPS,AFM,RBS / NRA进行表征
机译:脉冲激光沉积聚(甲基丙烯酸甲酯)薄膜:XRD,XPS,AFM,光学显微镜,拉曼光谱和FTIR的实验证据
机译:基于脉冲激光沉积合成的二氧化钒薄膜的可逆绝缘体-金属跃迁的开关应用。
机译:用于测微辐射热计和天线耦合测微辐射热计的五氧化二钒/钒多层薄膜的温度相关电阻特性
机译:通过飞秒脉冲激光沉积从五氧化钒(V2O5)生长的相变钒二氧化物(VO2)薄膜
机译:二氧化钒薄膜金属绝缘子转变的探索与优化