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Fiber laser annealing of nanocrystalline PZT thick film prepared by aerosol deposition

机译:气溶胶沉积法制备纳米晶PZT厚膜的光纤激光退火

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摘要

Nanocrystalline PZT thick films (1 mm square and over 10 μm thick) directly deposited onto stainless-steel substrates (PZT/SUS) by aerosol deposition (AD) technique and then annealed using focused laser beam with a fiber laser to suppress thermal damage to the back sides of the PZT/SUS and substrate near the film edge and to retain the dielectric and/or ferroelectric properties of the PZT/SUS. Compared with CO_2 laser annealing, fiber laser annealing suppressed thermal damage to the substrate. Compared with PZT/SUS annealed at 600 ℃ using an electric furnace, PZT/SUS annealed at 600 ℃ using a fiber laser showed superior properties, namely, dielectric constant e > 1200 at a frequency of 100 Hz, remanent polarization P_r > 30 μC/cm~2, and coercive field strength E_c<50kV/cm at a frequency of 10 Hz. Furthermore, the grain growth for the PZT/SUS formed by AD technique and annealed by fiber laser irradiation was occurred within the laser spot size.
机译:通过气溶胶沉积(AD)技术将纳米晶体PZT厚膜(1 mm正方形且厚度超过10μm的膜)直接沉积在不锈钢基底(PZT / SUS)上,然后使用聚焦激光束和光纤激光器进行退火,以抑制热损伤。薄膜边缘附近的PZT / SUS和衬底的背面,并保留PZT / SUS的介电和/或铁电特性。与CO_2激光退火相比,光纤激光退火抑制了对基板的热损伤。与使用电炉在600℃退火的PZT / SUS相比,使用光纤激光器在600℃退火的PZT / SUS具有优越的性能,即在100 Hz频率下介电常数e> 1200,剩余极化P_r> 30μC/ cm〜2,在10 Hz的频率下矫顽场强E_c <50kV / cm。此外,通过AD技术形成并通过光纤激光照射退火的PZT / SUS的晶粒生长发生在激光光斑尺寸内。

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