Structural And Morphological Characterization Of Tio_2 Nanostructured Films Grown By Nanosecond Pulsed Laser Deposition

摘要

TiO_2 has attracted a lot of attention due to its photocatalytic properties and its potential applications in environmental purification and self cleaning coatings, as well as for its high optical transmittance in the visible-IR spectral range, high chemical stability and mechanical resistance. In this paper, we report on the growth of TiO_2 nanocrystalline films on Si (1 0 0) substrates by pulsed laser deposition (PLD). Rutiie sintered targets were irradiated by KrF excimer laser (λ = 248 nm, pulse duration ～30 ns) in a controlled oxygen environment and at constant substrate temperature of 650 ℃. The structural and morphological properties of the films have been studied for different deposition parameters, such as oxygen partial pressure (0.05-5 Pa) and laser fluence (2- 4 J/cm～2). X-ray diffraction (XRD) shows the formation of both rutile and anatase phases; however, it is observed that the anatase phase is suppressed at the highest laser fluences. X-ray photoelectron spectroscopy (XPS) measurements were performed to determine the stoichiometry of the grown films. The surface morphology of the deposits, studied by scanning electron (SEM) and atomic force (AFM) microscopies, has revealed nanostructured films. The dimensions and density of the nanoparticles observed at the surface depend on the partial pressure of oxygen during growth. The smallest particles of about 40 nm diameter were obtained for the highest pressures of inlet gas.